Deposition and characterisation of functional ITO thin films

Giusti, Gaël (2011). Deposition and characterisation of functional ITO thin films. University of Birmingham. Ph.D.

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Abstract

Polycrystalline tin-doped indium oxide (ITO) thin films were prepared by Pulsed Laser Deposition (PLD) with an ITO (In\(_2\)O\(_3\)-10 wt.% SnO\(_2\)) target and deposited on borosilicate glass substrates. By changing independently the thickness, the deposition temperature and the oxygen pressure, a variety of microstructures were deposited. The impact on thin film physical properties of different gas dynamics is stressed and explained. Films deposited at room temperature (RT) show poorer opto-electrical properties. The same is true for films deposited at low or high oxygen pressure. It is shown that films grown with 1 to 10 mT Oxygen pressure at 200 °C show the best compromise in terms of transmittance and resistivity. The influence of the thickness, the substrate temperature and the oxygen pressure on the microstructure and ITO film properties is discussed. A practical application (a Dye Sensitized Solar Cell) is proposed.

Type of Work:	Thesis (Doctorates > Ph.D.)
Award Type:	Doctorates > Ph.D.
Supervisor(s):	Supervisor(s) Email ORCID Abell, J. S. UNSPECIFIED UNSPECIFIED Jones, Ian P. UNSPECIFIED UNSPECIFIED
Licence:	Creative Commons: Attribution-No Derivative Works 3.0
College/Faculty:	Colleges (2008 onwards) > College of Engineering & Physical Sciences
School or Department:	School of Metallurgy and Materials
Funders:	Engineering and Physical Sciences Research Council
Subjects:	T Technology > T Technology (General) Q Science > QC Physics
URI:	http://etheses.bham.ac.uk/id/eprint/1678

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• Deposition and characterisation of functional ITO thin films. (deposited 24 Jun 2011 15:54) [Currently Displayed]

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